Extreme ultraviolet lithography with table top lasers

Abstract

Compact extreme ultraviolet (EUV) lasers with “table top” footprints which can be easily installed in a small laboratory environment, had enabled in the last years applications that so far had been restricted to large synchrotron facilities. The high brightness and degree of coherence of these laser sources make them a good alternative for applications where a coherent illumination is required. One of these applications is nano-photolithography realized by interferometric or “holographic” lithography. This paper describes the advances and capabilities of compact photolithographic systems based on “table top” EUV lasers.