EUV Laser Irradiation System with Intensity Monitor

M Ishino,T Higashiguchi,M Hatayama,K Sakaue,T.-H Dinh,T Kawachi,M Washio,S Ichimaru,M Nishikino,N Hasegawa

doi:10.1007/978-3-030-35453-4_9

EUV Laser Irradiation System with Intensity Monitor

M Ishino, T Higashiguchi + Show 8 more

https://doi.org/10.1007/978-3-030-35453-4_9

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Publication Date: Jan 1, 2020

Affiliation: Utsunomiya University, Waseda University, National Institutes for Quantum and Radiological Science and Technology

#Extreme Ultraviolet Laser #Intensity Monitor + Show 8 more

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Abstract

AbstractWe have developed an extreme ultraviolet (EUV) laser irradiation system at QST. EUV laser has a wavelength of 13.9 nm, and this laser wavelength is close to the wavelength of EUV lithography (λ = 13.5 nm). The irradiation system has an intensity monitor based on the Mo/Si multilayer beam splitter. This intensity monitor provides the irradiation energy onto the sample surface. So it is possible to examine and confirm damage/ablation thresholds of optical elements and doses for the sensitivity of resist materials, which have the same specifications of those in the EUV lithography.

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