Abstract

We present a table-top extreme ultraviolet (XUV) beamline for measuring time- and frequency-resolved XUV-excited optical luminescence (XEOL) with additional femtosecond-resolution XUV transient absorption spectroscopy functionality. XUV pulses are generated via high-harmonic generation using a near-infrared pulse in a noble gas medium and focused to excite luminescence from a solid sample. The luminescence is collimated and guided into a streak camera where its spectral components are temporally resolved with picosecond temporal resolution. We time-resolve XUV-excited luminescence and compare the results to luminescence decays excited at longer wavelengths for three different materials: (i) sodium salicylate, an often used XUV scintillator; (ii) fluorescent labeling molecule 4-carbazole benzoic (CB) acid; and (iii) a zirconium metal oxo-cluster labeled with CB, which is a photoresist candidate for extreme-ultraviolet lithography. Our results establish time-resolved XEOL as a new technique to measure transient XUV-driven phenomena in solid-state samples and identify decay mechanisms of molecules following XUV and soft-x-ray excitation.

Highlights

  • We have reported on a table-top XUV beamline capable of measuring luminescence excited by visible deep ultraviolet (DUV) and XUV sources in a time- and frequency-resolved manner using an integrated streak camera

  • By measuring a high quantum efficiency (QE) scintillator, a fluorophore, and a photoresist material tagged with the fluorophore, we demonstrated its versatility in measuring different types of luminescent materials

  • The addition of a high temporal resolution IR to DUV pump/XUV probe allows for XUV transient absorption (XTAS) measurements to get a more complete view of molecular and electronic dynamics on an fs to ns time scale in relevant samples, and if necessary, XUV-excited optical luminescence (XEOL) and XTAS measurements can be run simultaneously

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Summary

INTRODUCTION

Photoinduced elementary molecular processes take place on ultrashort time scales ranging from attoseconds to nanoseconds. High-harmonic generation (HHG) in the extreme ultraviolet (XUV) from a fundamental infrared laser pulse is an important tool to study ultrafast processes due to both the attainable ultrashort pulse durations and the short wavelengths of extreme ultraviolet (XUV) (120 to 10 nm) and x-ray (

Beamline overview
XUV flux estimate
XUV TRANSIENT ABSORPTION
XEOL behavior of sodium salicylate
Characterizing 4-carbazole benzoic acid
Luminescence dynamics of a tagged photoresist
Findings
CONCLUSION
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