Abstract
External electric field has great effect on grating formation via additional carrier drift during nonvolatile holographic recording. The photorefractive properties of doubly doped LiNbO 3 :Fe:Mn crystals are theoretically investigated by jointly solving the two-center material equations with nonzero external electric field and the coupled-wave equations. The external electric field dependence of the refractive-index changes n 1 , the diffraction efficiency η as well as the photorefractive sensitivity S are studied for oxidized LiNbO 3 :Fe:Mn crystals. Significant improvement of the photorefractive performance has been revealed by applying external electric fields to oxidized LiNbO 3 :Fe:Mn. The enhanced material performance under external electric field improves the applicability of doubly doped LN crystals.
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