Abstract
Based on jointly solving the two-center material equations with nonzero external electric field and the coupled-wave equations, we have numerically calculated the variations of the depth of refractive-index change and the spatial phase shift (between the grating and the light interference pattern) in the steady state versus various external electric fields. Different effects are found in the recording and the fixing phases of the nonvolatile holographic recording, and consequently, external electric fields applied in the positive direction along c axis (or large one in the negative direction of c axis) in the recording phase and that applied in the negative direction of c axis in the fixing phase are proved to benefit strong photorefractive performance. Experimental verifications are given with small external electric field.
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