Abstract
Widely used coating materials, such as tantalum carbide, silicon nitride and aluminum nitride, were exposed to chlorine trifluoride gas at various temperatures. The tantalum carbide powder was etched and vaporized by a quick and significant exothermic chemical reaction at temperatures higher than room temperature. The silicon nitride powder was etched that produced volatile products at temperatures higher than 250°C. An aluminum nitride plate and powder showed a slight increase in weight at temperatures higher than 500°C due to fluorination. The aluminum nitride plate thickness increased causing a surface smoothing effect without any cracking. The aluminum nitride is expected to work as the anticorrosive coating material to the chlorine fluoride gas at high temperatures, thus allowing fluorination.
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