Abstract
The refractive indices of photoresists used for direct laser writing (DLW) have been determined after exposure to ultraviolet (UV) light. However, it was anticipated that the refractive index will differ when applying a two-photon polymerization (TPP) process. In this Letter, we demonstrate that this is indeed the case. Making use of a guided mode coupling approach, we measure the dispersive real part of the refractive index (n) of a commercial photoresist (IP-Dip, Nanoscribe) at very high accuracy. Additionally, the imaginary part of the refractive index (k) is determined from absorption measurements for wavelengths in the range 300 to 1700nm. TPP layers exhibit a significantly lower refractive index than their UV exposed bulk counterparts (Δn up to 0.01). Furthermore, when fabricating a TPP shell and UV exposing the interior, the refractive index of the shell will not change. This is an important consideration for optical component design and opens the possibility for low refractive index difference wave guiding.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
