Abstract
Sputtering yields of amorphous metal alloys of FeCoSiB are measured and compared with numerical simulations based on the TRIM.SP code. The amorphous samples are prepared under well controlled cooling condition during quenching, resulting in well defined values of the density and bonding energy. The Ar ion beam sputtering is carried out by using a Kaufman-type ion source with an ion energy and ion current density of 1.0 keV and 0.6 mA/cm 2. From the eroded depth, the sputtering yield is determined as function of atomic density and bonding energy, showing remarkable dependence on both these quantities. The change of measured sputtering yield is explained by the simulation.
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