Abstract
Uniform graphene films and micro-patterns are the cornerstones of graphene-based printed electronics. However, disk-like reduced graphene oxide (RGO) sheets trend to concentrate at the edge of the drop because of the famous coffee-ring effect, resulting in non-uniform patterns. To understand the physics of coffee-ring formation for RGO droplets on hydrophilic substrates, we propose a mechanical model to elucidate the influence and its mechanism of substrate wettability on the solute migration behavior and solute distribution morphology of RGO droplets. Stronger coffee-ring morphology and a slower velocity transition on the PMMA can be observed as compared to that on the glass slides. An explanation based on the mechanical model is provided as the large contact angle on the PMMA leads to a small hindrance force and finally results in more significant coffee-ring morphology. Remarkably, we have revealed one underlying mechanism by which the hydrophilic substrate with better wettability will form more uniform patterns. This study can provide fundamental insights into the relationship between substrate wettability and RGO sheets distribution morphology. It might contribute to morphology regulation of RGO droplets in the DOD printing of graphene films and micro-patterns.
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