Abstract
Evanescent-coupled antireflection coatings (EC-ARCs) are a form of ARC designed to operate in the hypernumerical aperture regime relying on evanescently coupled resonators to provide backward going fields for destructive interference. Two experimental EC-ARC designs are tested in an immersion interference lithography system at a wavelength of 405 nm: a MgF2|Cr surface state resonator based ARC at a numerical aperture (NA) of 1.4046 and transverse magnetic polarization, and a SiO2|HfO2|Si dielectric resonator based ARC at an NA of 1.5 and transverse electric polarization. The MgF2|Cr system was shown to partially suppress standing waves with a void footing indicating the system is resonating, albeit in a suboptimal fashion. The SiO2|HfO2|Si system was shown to almost fully suppress standing waves. These results indicate that with improved manufacturing techniques evanescent-coupled ARCs can be an effective method of standing wave suppression for photolithography.
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