Abstract
Exfoliation of carbon nitride (g-C3N4) into an ultrathin nanostructure significantly improves its photoactivity. However, the effects of the exfoliation method on the microstructure and photocatalytic performance of g-C3N4 nanosheets remain largely unknown. Herein, several typical strategies, such as thermal, chemical, ultrasonic and one-step exfoliation, were applied to exfoliate g-C3N4 nanosheets for photocatalytic applications. A procedure capable of controlling the morphology, microstructure, light-absorption property, and visible light photoactivity of g-C3N4 nanosheets was attempted. We found that nanosheets prepared from one-step exfoliation present superior photocatalytic efficiency under visible light than those fabricated by thermal exfoliation and ultrasonic exfoliation. The kinetic constants for bisphenol A (BPA) photodegradation over these samples were determined to be 6.5, 4.5 and 2.3 times higher than bulk g-C3N4, respectively. For chemical exfoliation, excessive oxidation by H2SO4 can lead to the structural defects and deactivation of urea-derived g-C3N4 nanosheets. Carbon nitride nanosheets synthesized by one-step exfoliation exhibited high specific surface area, optimal band gap energy structure, and high charge separation efficiency, thereby increasing visible-light photoactivity. Enabling cost-effective production of ultrathin and robust g-C3N4 nanosheets, one-step exfoliation offers a potential strategy to exploit high-performance g-C3N4 for water purification applications.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.