Abstract
In the first step of the LIGA process a resist layer is patterned by deep etch X-ray lithography. The exposed parts are dissolved by an organic developer. To achieve perfect microstructures the development must be free of residue, and the unexposed parts should not be attached. Our studies showed that the solid PMMA material in the resin, as well as the unexposed resist contains at the applied developer temperature soluble parts. Therefore the molecular weight distribution of the resist and the solid PMMA material was investigated as a function of the hardener system respectively the initiator and the regulator concentration. Formation of low molecular weight molecules in the resist layer can only be suppressed if the hardener content is small and if the resin contains no low weight molecules. On the basis of these findings an optimised resist was produced and the quality of the microstructures considerably improved.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
