Abstract
This work provides experimental evidence for the validity of the elementary reaction model of dimethyl-aluminum-hydride (DMAH) on the aluminum surface which the authors developed using a combination of experiments and quantum chemical calculations. Surface adsorbates on an aluminum film were analyzed with in situ infrared reflection absorption spectroscopy (IRAS) during chemical vapor deposition (CVD). Peaks of –CH3 and C–Al–C structures were observed, which was in accordance with the reaction model. The absence of an Al–H peak also supported the model. In order to examine the validity of the model quantitatively, the authors observed the dependence of the absorbance peak area on the surface temperature. This dependence was roughly in agreement with the corresponding results of elementary reaction simulations based on the reaction model.
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