Abstract
The evolution of thin-film morphologies during ion beam bombardment has been examined by a combination of experimental and molecular dynamics simulation methods. Surface roughness, stress and domain growth in amorphous and nanocrystalline films were investigated. The experiments provide support for the model of radiation-induced viscous flow. The coefficient of radiation-induced viscosity deduced from the experiments is insensitive to both the particular material and the irradiation particle. The computer simulations, using molecular dynamics, reveal that while flow may be caused by local melting of nanometer-sized regions along the track of the ion, in some cases the simple creation of point defects is sufficient to explain radiation-induced stress relaxation.
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