Evolution of plasma parameters in an Ar–N2/He inductive plasma source with magnetic pole enhancement

Abstract

Magnetic pole enhanced inductively coupled plasmas (MaPE-ICPs) are a promising source for plasma-based etching and have a wide range of material processing applications. In the present study Langmuir probe and optical emission spectroscopy were used to monitor the evolution of plasma parameters in a MaPE-ICP Ar–N2/He mixture plasma. Electron density and temperature excitation temperature plasma potential skin depth and the evolution of the electron energy probability function (EEPF) are reported as a function of radiofrequency (RF) power, pressure and argon concentration in the mixture. It is observed that increases while decreases with increase in RF power and argon concentration in the mixture. The emission intensity of the argon line at 750.4 nm is also used to monitor the variation of the ‘high-energy tail’ of the EEPF with RF power and gas pressure. The EEPF has a ‘bi-Maxwellian’ distribution at low RF powers and higher pressure in a pure discharge. However, it evolves into a ‘Maxwellian’ distribution at RF powers greater than 70 W for pure and at 50 W for higher argon concentrations in the mixture. The effect of argon concentration on the temperatures of two electron groups in the ‘bi-Maxwellian’ EEPF is examined. The temperature of the low-energy electron group shows a decreasing trend with argon addition until the ‘thermalization’ of the two temperatures occurs, while the temperature of high-energy electrons decreases continuously.