Abstract
Systematic variation of anisotropic X-ray line broadening in vapour-deposited Pb films of various thicknesses on glass substrates is studied using dislocation model of strain anisotropy incorporated into a modified Williamson-Hall and modified Warren-Averbach procedure. For smaller film thicknesses in the range of about 100-200 nm, the dislocation network is less correlated and contains substantial screw component and twin or growth faults. The films of larger thicknesses (greater than 500 nm), on the other hand, consist mostly of edge dislocations with a more regular and correlated dislocation structure. The present study reveals the inadequacy of applicability of conventional Warren-Averbach analysis in regular and correlated dislocation structures.
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