Abstract
When amorphous ${\mathrm{Co}}_{1\ensuremath{-}x}{\mathrm{Ti}}_{x}$ soft ferromagnetic thin films are deposited by rf sputtering in the presence of a dc magnetic field one observes a somewhat bell-shaped variation of the induced in-plane uniaxial anisotropy energy ${K}_{u}$ as a function of the pressure of the sputtering gas ${P}_{\mathrm{Ar}}$. The maximum value of ${K}_{u}(x)$, ${[{K}_{u}(x)]}_{max}$, is obtained for the same ${P}_{\mathrm{Ar}}$ for the whole concentration range studied $0.14\ensuremath{\le}x\ensuremath{\le}0.22$. The origin and the overall variations of ${K}_{u}$ are interpreted for the first time in terms of the atomic local anisotropies. The continuous decrease of ${({K}_{u})}_{max}$ with increasing Ti concentration is explained by the progressive change of the local structure.
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