Abstract

In recent years, atmospheric-pressure nonequilibrium plasma processing using microdroplets has attracted significant attention. To improve the controllability of this process, an understanding of the evaporation behavior of droplets in plasma is highly desirable. In this study, we examine the evaporation behavior of well-controlled inkjet droplets in atmospheric-pressure nonequilibrium argon plasma through both experiments and modeling. A comparison of the droplet evaporation model based on energy balance considering gas temperature, electron and ion collisions, and recombination reactions with experimental evaporation behavior suggests that droplet evaporation is enhanced in high-density plasma environments with electron and ion densities exceeding 1019 m−3 when compared with that in non-ionized gaseous environments at a gas temperature below 1000 K.

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