Evaluation of nanoimprint lithography as a fabrication process of phase-shifted diffraction gratings of distributed feedback laser diodes

Abstract

The authors have succeeded in employing nanoimprint lithography (NIL) to form diffraction gratings of distributed feedback laser diodes (DFB LDs) used in optical communication. Uniform gratings and phase-shifted gratings with periods of 232 nm have been formed by using a reversal NIL with a step-and-repeat imprint tool. Line edge roughness has been sufficiently low with the fabricated gratings. DFB LDs fabricated by NIL have indicated comparable characteristics with LDs fabricated by electron beam lithography. LDs show high long-term stability in threshold current. The authors have also demonstrated that phase-shifted DFB LDs show better uniformity in characteristics than uniform-grating DFB LDs. The results of this study indicate that NIL has high potential for fabricating DFB LDs.