Abstract
Herein, we describe the fabrication of LiCoO2 thin films by high-frequency (27.12 MHz) magnetron sputtering and investigate the effects of sputtering power and Ar/O2 ratio on their morphological and electrochemical properties. Films produced at higher sputtering powers and O2 proportions are shown to exhibit increased porosity and a greater number of surface active sites. The discharge capacity of the film prepared at a sputtering power of 180 W and an Ar/O2 ratio of 1/2 is determined as 22.894 μAh μm–1 cm–2 using half-cell electrochemical testing at 0.2 C for 20 charge–discharge cycles, and ∼90% of the 0.2 C discharge capacity is retained at 1.5 C. Finally, we compare films deposited at 27.12 MHz with those deposited at 13.56 MHz, showing that the former feature the advantages of higher deposition rate and increased surface porosity, which results in excellent electrochemical performance and good rate capability.
Published Version
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