Abstract

In this paper a possibility of performing fluorescence experiments in extreme ultraviolet (EUV) using a laboratory EUV source was demonstrated. Usually such measurements are performed using third-generation synchrotrons because of extremely low probability of fluorescence in this wavelength range. In this work a 10 Hz laser-plasma EUV source based on a gas puff target was used. Fluorescent radiation from Al and Si was registered. Despite relatively low spectral resolution, some differences in Si spectra coming from different kind of samples were revealed.

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