Abstract
The adsorption and desorption behavior of ethylene oxide on K‐modified Ni(111) was studied in a wide range of K coverage [Θ(K)=0 to ≥0.36]. In the low K coverage regime Θ(K)≤0.1, referred to as ‘‘ionic’’ K, the ethylene oxide adsorption is, as on clean Ni(111), molecular. The binding strength of ethylene oxide towards the K/Ni(111) surface is weak; complete desorption occurs below 250 K. In the higher K coverage regime Θ(K)≥0.36, referred to as ‘‘metallic’’ K, a thermal stabilization of ethylene oxide in the presence of metallic K is observed, which is due to a ring breaking of the ethylene oxide molecule and to the formation of a radical.
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More From: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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