Abstract
AbstractThis paper deals with two (main) problems of specific gold etching from parts of industrial equipment (e.g., supporting inserts into chambers for physical or chemical vapor deposition). First part of the paper is focused on selective etching of gold from aluminum substrates. Selectivity of the reaction, i.e. leaving substrates intact, is crucial. For this reason, the environmentally friendly and safe method of etching gold in a thiourea solution was tested. This method, while well described in literature, does not preserve various substrates (e.g., aluminum, stainless steel). The main goal of this part of the paper was to understand the mechanism of the reaction and to improve the reaction selectivity towards the aluminum alloy substrate. Thus, different acidifying agents were tested. Second part of the paper is focused on recovery (reduction) of gold from thiourea solutions. Chemical, electrochemical, and biological reduction were tested for gold recovery.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
