Abstract
The dimensions of cluster phases that form on the surfaces of free Cu and Ag films in the case of different irradiation doses are estimated for the first time. It is shown that ion implantation leads to a significant decrease in the number of ions passed through a free film. Under the same conditions of the ion implantation, the concentration of impurity atoms on the surface and their depth-distribution profile for the free film differ noticeably from those for a bulk crystal.
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Schedule a callMore From: Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques
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