Abstract
Silicon multilayer thin films with stack of amorphous silicon (a-Si:H) and nanocrystalline silicon (nc-Si:H) of varied hydrogen dilution were prepared by hot wire chemical vapor deposition (HWCVD). The optical properties of the thin films were measured by UV-visible spectroscopy. The smooth transmittance spectra measured in the range of 500-1100nm show films with uniform deposition. The optical constants such as refractive index, absorption coefficient, tauc band gap, extinction coefficient together with thickness were determined using envelope method. It is found that the optical band gap decreases from 1.78eV to 1.6eV as hydrogen dilution increases.
Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
