Abstract

Titanium dioxide thin films were deposited on (0001) α-quartz substrate by spray pyrolysis method. The method which an aerosol of Titanium Butoxide, generated ultrasonically, was sprayed on the substrate at temperature of 400°C, kept at this temperature for periods of 3, 13, 19 and 39 hours. The developed films at a crystal phase correspond to the TiO2 anatase and rutile phases. Their surface roughness increased by annealing the samples at 600, 800 and 1000°C. Deposited film annealed at 1000°C showed preferable orientation in (110) direction. The crystal evolution and crystallographic properties of this material was studied by Lotgering method, X-ray Diffraction (XRD) and Scanning Electron Microscopy (SEM). The study revealed that the deposition process was nearly close to the classical Chemical Vapour Deposition (CVD) technique that is generally employed to produce films with smooth surface and good crystalline properties with a thickness of about 1 µm, as measured by Focused Ion Beam.

Highlights

  • In the past decade, considerable efforts were made to synthesize self-cleaning materials, especially titanium dioxide (TiO2 or titania)

  • The crystal evolution and crystallographic properties of this material was studied by Lotgering method, X-ray Diffraction (XRD) and Scanning Electron Microscopy (SEM)

  • The study revealed that the deposition process was nearly close to the classical Chemical Vapour Deposition (CVD) technique that is generally employed to produce films with smooth surface and good crystalline properties with a thickness of about 1 μm, as measured by Focused Ion Beam

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Summary

Introduction

Considerable efforts were made to synthesize self-cleaning materials, especially titanium dioxide (TiO2 or titania). For self-cleaning applications, a titania film with small band gap and large surface area (small grain size) is required. Rutile phase has smaller band gap but the resultant grains are larger compared to anatase. Having this point in mind, one can conclude that an intermediate phase between anatase and rutile probably benefits from both small band gap and moderate grain size and is advantageous for self-cleaning materials. This study has been designed to confirm the formation of a film with mixed phase of anatase and rutile structures at 400 ̊C. This was verified by inspecting the variation of effective parameters (such as time, substrate and annealing temperature) on the samples

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