Abstract
The epitaxial surface of NiSi2 (100) has been examined using both low-energy electron diffraction and scanning tunneling microscopy. Under proper conditions, a surface structure with √34 ×√34 symmetry is found, consisting of silicon adatoms occupying nominal 1×1 sites. The superstructure comprises an ordered array of adatom vacancies. A disordered surface phase is observed under suboptimal sample preparation conditions which consists of the elements of the ordered phase arranged in a nonperiodic manner.
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