Abstract
A technique for producing single crystals of nickel by epitaxial growth from the vapour phase is described. Thin films of nickel, several hundred angstroms thick, were deposited on substrates of rocksalt crystals. The rocksalt surface exposed to the vapour stream was cleaved in the (100) orientation or it was mechanically polished in the (100), (110) and (111) orientations. A simple polishing device was designed for obtaining substrate surfaces of any desired crystallographic orientation. Electron diffraction patterns of the films made in a vacuum ranging between 10 -4 and 10 -5 torr were studied in terms of the following parameters: deposition rate, substrate temperature, and substrate preparation. It was found that increasing substrate temperature during deposition, preheating the substrate before deposition, and maintaining a high rate of deposition all favour epitaxy.
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