Epitaxial Growth of Magnesia Films on Single Crystalline Magnesia Substrates by Atmospheric-Pressure Chemical Vapor Deposition

Keiji Komatsu,Nozomi Kobayashi,Ikumi Toda,Shigeo Ohshio,Hiroyuki Muramatsu,Pineda Marulanda David Alonso,Hidetoshi Saitoh

doi:10.5539/jmsr.v5n2p56

Abstract

<p class="1Body">MgO films were epitaxially grown on single crystal MgO substrates by atmospheric-pressure chemical vapor deposition (CVD). Reciprocal lattice mappings and X-ray reflection pole figures were used to evaluate the crystal quality of the synthesized films and their epitaxial relation to their respective substrates. The X-ray diffraction profiles indicated that the substrates were oriented out-of-plane during MgO crystal growth. Subsequent pole figure measurements showed how all the MgO films retained the substrate in-plane orientations by expressing the same pole arrangements. The reciprocal lattice mappings indicated that the whisker film showed a relatively strong streak while the continuous film showed a weak one. Hence, highly crystalline epitaxial MgO thin films were synthesized on single crystal MgO substrates by atmospheric-pressure CVD.</p>

Highlights

Magnesium oxide (MgO) has attracted the attention of many researchers for application to semiconductors (Bian et al, 2004; Henyk et al, 2005; Nam et al, 2006; Tamboli et al, 2009; Nakano et al, 2004)
MgO films were epitaxially grown on single crystal MgO substrates by atmospheric-pressure chemical vapor deposition (CVD)
Highly crystalline epitaxial MgO thin films were synthesized on single crystal MgO substrates by atmospheric-pressure CVD

Summary

Introduction

Magnesium oxide (MgO) has attracted the attention of many researchers for application to semiconductors (Bian et al, 2004; Henyk et al, 2005; Nam et al, 2006; Tamboli et al, 2009; Nakano et al, 2004). Atmospheric-pressure chemical vapor deposition (CVD) is a method of depositing high-quality metal oxide films onto various substrates at atmospheric pressure and without requiring a vacuum system(Saitoh, Okada, & Ohshio, 2002; Saitoh, Takano, Kawaguchi, Washio, Ohshio, & Akasaka, 2009; Akasaka et al, 2013; Sugata et al, 2003; Satoh et al, 2002; Satou et al, 1999; Saitoh, Fukada, & Ohshio, 2003; Tokita, Tanaka, & Ohshio, 2003; Tokita, Tanaka, & Saitoh, 2000). Atmospheric-pressure CVD was used to deposit epitaxial MgO films onto single crystalline magnesia substrates.

Experimental Work

Characterization

Morphological Study

Conclusion