Epitaxial growth and thermoelectric properties of Mg3Bi2 thin films deposited by magnetron sputtering

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Mg3Sb2-based thermoelectric materials attract attention for applications near room temperature. Here, Mg-Bi films were synthesized using magnetron sputtering at deposition temperatures from room temperature to 400 °C. Single-phase Mg3Bi2 thin films were grown on c-plane-oriented sapphire and Si(100) substrates at a low deposition temperature of 200 °C. The Mg3Bi2 films grew epitaxially on c-sapphire and fiber-textured on Si(100). The orientation relationships for the Mg3Bi2 film with respect to the c-sapphire substrate are (0001) Mg3Bi2‖(0001) Al2O3 and [112¯0] Mg3Bi2‖[112¯0] Al2O3. The observed epitaxy is consistent with the relatively high work of separation, calculated by the density functional theory, of 6.92 J m−2 for the Mg3Bi2 (0001)/Al2O3 (0001) interface. Mg3Bi2 films exhibited an in-plane electrical resistivity of 34 μΩ m and a Seebeck coefficient of +82.5 μV K−1, yielding a thermoelectric power factor of 200 μW m−1 K−2 near room temperature.