Abstract
Epitaxial growth of erbium-doped cerium oxide (Er:CeO2) is achieved on Si (111) substrates by the cooperative integration of Si and oxide molecular beam epitaxy (MBE) technologies. Lattice matching between CeO2 and Si provides an attractive opportunity to build dilutely doped Er-based optical devices on a Si chip. The CeO2 host crystal is optically transparent for the telecom C-band wavelength and has quite a small magnetic moment, which serves as a disturbance-free environment for the two-level system formed in the doped Er. After the systematic optimization of the growth conditions for stoichiometric Er:CeO2; i.e., (Er + Ce)/O = 1/2, we varied the Er concentration in a range of 1 ~4%. The doped Er showed well-defined optical transitions at the wavelength of 1.533 μm irrespective of the Er concentration. With decreasing Er concentration, enhancement of the luminescence intensity, narrowing of the spectral width, and an increase in the radiative lifetime were observed. The results suggest that CeO2 on Si is promising as a platform for the doped-Er-based optical devices and their quantum optics applications.
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