Abstract
TiO2 thin films when irradiated by UV light with a wavelength of 365 nm is investigated. The results indicate that the annealed samples have higher oxygen sensitivities than the as-deposited samples. The sensitivity of the non-annealed samples increases from 0.70 to 1.15 under UV irradiation, while the sensitivity of the annealed samples increases from 7.17 to 10.60. Therefore, it is clear that UV irradiation causes the sensitivity of the SnO2/TiO2 thin films to increase significantly. Finally, it is found that the oxygen sensitivity of the SnO2/TiO2 thin films increases as the SnO2/TiO2 ratio is reduced.
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