Enhancing the photoresponse of electrodeposited WO3 film: Structure and thickness effect

Abstract

Electrodeposited WO3 thin films were prepared on the W, Ti, and Nb metal substrates in strongly acidic solution containing a tungsten precursor of (0.025M sodium tungstate dihydrate powder (Na2WO4·2H2O)) and by varying the applied potential. The applied potential determined the thickness and crystallite size of the deposited WO3 thin films, irrespective of the metal substrate. The thickness and crystallite size of the films, as well as the total consumed electric charge (Q), increased as the applied potential was increased from −0.27 to −0.47V. Conversely, the photoelectrochemical (PEC) activity declined as the deposition potential increased; the optimal performance was achieved at a deposition potential of −0.27V for all metal substrates. This potential generated a porous WO3 film or a very thin WO3 layer composed of small nanoparticles, both of which were favorable for electrolyte penetration leading to enhanced charge transport/transfer behavior and providing a large contact area for the electrolyte. Furthermore, the PEC performance of WO3 on the W substrate was higher than those on the Ti and Nb substrates because of the homogenous composition of the W substrate that resulted in the least lattice disturbance. Thus, the maximum photocurrent density of 1.68mA/cm2 at 1.5V (vs. saturated Ag/AgCl) with an IPCE of 31% at 330nm was obtained with the electrodeposited WO3 film grown at a deposition potential of −0.27V on the W substrate. The charge-transport and charge-transfer behavior of the electrodeposited WO3 film were respectively discussed based on linear sweep voltammograms and electrochemical impedance spectroscopy.