Abstract
Enhancing the hardness of nanocrystallite TiN films synthesized on M2steel substrate in a vacuum cathode multi-arc ion-plating system wasinvestigated. The synthesized film gives: (i) mean grain sizes of about 12.7 nm forTiN111, 19.7 nmfor TiN200 and9.6 nm for TiN220; and (ii) achievable microhardness up to 45 GPa that is more than twice the 22 GPa forstandard TiN film. Such hardness enhancement is anticipated as being mainly due to:(i) the formation of nanoscale crystalline grains; (ii) the preferential orientation and growthof grains in the close-packed plane (111); and (iii) induced residual stress within the film byion bombardment.
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