Abstract

Reducing the anthropogenic emission of electron specialty gases (F-gases, e.g., NF3, CF4 and SF6) in semiconductor industry is vital due to the strong greenhouse effect of F-gases. Herein, a microporous metal-organic framework (SBMOF-1) has proved effective for F-gases trapping owing to the enhanced dispersion force in ultramicropores. The 5–8.5 Å pocket-like pore offers overlapped intermolecular interactions in SBMOF-1 for trapping F-gases. Outstanding F-gases/N2 IAST selectivity and time-dependent adsorption tests confirmed the adsorptive separation performance of SBMOF-1. Moreover, breakthrough experiments also manifest the practical potential of SBMOF-1 for capturing F-gases from semiconductor etching exhaust.

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