Abstract
We present a pupil filter design method based on iterative optimisation of the intensity point spread function (PSF) of a binary phase-only diffractive optical element, for use in a lens, diffractive element combination. Increase in the depth of focus and control over the sidelobe levels in the PSF is shown. The favourable performance is retained in simulated aerial images when the pupil filter is incorporated into a typical photolithography system.
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