Abstract
The point spread function (PSF) plays an important role in electron beam lithography, e.g., for the estimation of the resist profile, proximity effect correction, etc. The conventional approach often derives PSFs directly from the Monte Carlo simulation, which might have a limitation in the spatial resolution under a certain size of memory available on a computer. A novel method is proposed to enhance the spatial resolution of PSFs generated from the Monte Carlo simulation without increasing the memory size or changing the simulation software. It exploits the fact that the PSF is radially symmetric and utilizes the concept of integrating the PSF. The integrated PSF is generated by the Monte Carlo simulation, and then the PSF is mathematically derived from its integration. Simulation results show that the proposed method has good potential for providing a practical way to enhance the spatial resolution of the PSF.
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