Abstract

Perovskite/MoS2 hybrid thin film transistor photodetectors consist of few-layered MoS2 and CH3NH3PbI3 film with various thickness prepared by two-step vacuum deposition. By implementing perovskite CH3NH3PbI3 film onto the MoS2 flake, the perovskite/MoS2 hybrid photodetector exhibited a photoresponsivity of 104 A/W and fast response time of about 40 ms. Improvement of photodetection performance is attributed to the balance between light absorption in the perovskite layer and an effective transfer of photogenerated carriers from perovskite entering the MoS2 channel. This work may provide guidance to develop high-performance hybrid structure optoelectronic devices.

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