Abstract
Vanadium dioxide (VO2) thin films were fabricated on SiO2 microsphere array surface by vacuum thermal pre-annealing and rapid thermal oxidization annealing of magnetron sputtering vanadium films. The effects of vacuum thermal pre-annealing temperature on phase transition properties of VO2 thin films were investigated. The resistance transition ranges of phase transition are improved from 7.58 to 10.23 as the increasing of vacuum thermal pre-annealing temperature. The phase transition temperature decreases and the width of thermal hysteresis loop keeps constant. We analyzed the effects of vacuum thermal pre-annealing temperature on phase transition properties of VO2 thin film in the light of vanadium thin film shrinking effects. The results are important for fabrication of ultrathin VO2 film on microsphere array and application in optical regulation field.
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