Abstract
Soft imprinting lithography enhanced by a UV light (UV-SIL) takes advantages of both nanoimprint and soft lithography. Compared to the related techniques, the UV-SIL process uses single or multi-layer soft stamps and works at room temperature under low pressure (<0.5 bar). The advantage of using soft stamps relies on its conformable patterning over a large wafer area. In addition, the optical transparency of the stamps and the room temperature and low pressure imprint conditions make a high precision alignment achievable and the whole UV-SIL process compatible to the requirement of high-throughput production. In this work, we describe our recent achievements on the stamp fabrication, high resolution and large area imprinting. In particular, we demonstrate a reliable lift-off process which can be used for a wide range of applications.
Published Version
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