Abstract
Atmospheric plasma treatment of indium tin oxide (ITO) surfaces has been studied and demonstrated to be the most efficient method in improving the performance of vacuum-deposited double-layer organic light-emitting diode devices, among various plasma treatment methods including low-pressure Ar plasma and low-pressure O2 plasma treatment. Although with a current–voltage characteristic close to low-pressure O2 plasma treatment, the atmospheric plasma treatment exhibits a 40% increase of electroluminescence efficiency. X-ray photoelectron spectroscopy results show that the atmospheric plasma treatment increases the work function and reduces the carbon contamination of ITO surfaces. Our results suggest that atmospheric plasma treatment is a cheaper, more convenient, and more efficient method than low-pressure O2 plasma treatment for improving device performance.
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