Enhanced fabrication of conical array via two-stage through mask electrochemical machining process

Abstract

In response to the issues of low processing precision, poor surface quality, and low array uniformity in the fabrication process of metal array conical structures, this paper proposes a two-stage enhanced process for fabricating metal array conical structures using through-mask electrochemical machining (TMECM). The micro-convex structure with high consistency can be quickly obtained through the first electrochemical machining (ECM), and then the mask is removed and the micro-convex structure is modified twice. The top diameter of the micro-structure is reduced by using the phenomenon of electric field concentration in the ECM process, and the top curvature radius of the micro-structure is further reduced, so as to increase the height diameter ratio of the micro-structure and improve the surface quality. The results show that during the initial ECM, when the machining time is 35 s, the voltage is 20 volts, the flow rate of the acid etching solution is 1 m /s, the duty cycle is 50 %, and the frequency is 200 Hz, the stable machining of the metal array conical structure can be achieved. In the secondary electrochemical surface modification, it was found that under the conditions of working solution containing 2 mol/L nickel-based etching agent, pulse voltage of 20 V and processing time of 35 s, the method effectively improved the surface quality of the workpiece and ensured the stable manufacturing of the micro-conical array structure. The prepared microstructure height was 198 μm and the top diameter was 28 μm.