Enhanced dielectric properties and grain boundary potentials in sulfur-doped CaCu3Ti4O12 thin films

Abstract

CaCu3Ti4O12 (CCTO) has been reported to possess a colossal dielectric constant owing to the intrinsic interfacial polarization via charge accumulations across the grain boundary. Herein, we explore the effects of unusual anion-doping on the dielectric properties of sputter-deposited CCTO thin films using an example of sulfur-doping. A post-annealing process of the films was utilized in a flowing H2S atmosphere for the sulfur-doping. The incorporation of sulfur into the perovskite structure was evidenced with the changes in chemical states, such as the reduced cations of Cu+ and Ti3+, the increased concentration of oxygen vacancies, and the formation of S-O bonds. The sulfurized CCTO thin films demonstrated an enhanced relative permittivity of ∼620 at 100 Hz, which is substantially better than that of the unsulfurized film. Direct measurement of the grain-boundary potential using Kelvin probe force microscopy suggests that the enhanced relative permittivity is associated with an increased Schottky barrier height.