Abstract
AbstractThis paper reports the use of a multiple thrust methodology to monitor the atmospheric pressure plasma‐enhanced chemical vapour deposition (PE‐CVD) of silica films on glass. Simultaneous spectroscopic analysis: optical emission spectroscopy, FT‐IR spectroscopy and in situ near‐infrared laser diode spectroscopy have been combined with electrical measurements to investigate the plasma during the deposition process. The experimentation has been carried out as a chemometric design so as to derive statistical models tying the affected variables to the measured results. Initial results confirm the viability of this approach for improved process understanding, process control and enhanced design capabilities.
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