Encapsulation of organic solar cells with ultrathin barrier layers deposited by ozone-based atomic layer deposition

Abstract

Listen

Translate article

Ultrathin Al 2O 3 layers, deposited using atomic layer deposition (ALD), have been utilized as the primary barrier layers for encapsulation of organic solar cells. This work shows that the encapsulation characteristics of a barrier layer can be accentuated by replacing H 2O with O 3 as the ALD oxidant. The Al 2O 3 layers deposited using O 3 offered superior device encapsulation compared to the films deposited using H 2O. The organic solar cell efficiency has also been studied as a function of Al 2O 3 thickness and effective encapsulation has been monitored for two different ALD temperatures.