Abstract
An rf magnetron discharge used to sputter PbTe in Ar is analyzed using emission spectroscopy. The intensity (I) of the strong Pb, Te, and Ar emission lines is determined near the target and near the substrate as the rf power or gas pressure is varied. It is shown that as the rf power is varied at pressures below 0.5 Pa, the electron temperature is not affected, so that the sputtered atom density NPb is proportional to IPb/IAr. The electron temperature is, however, sensitive to pressure changes. Application of a substrate bias voltage has a large effect on the emission spectra which are not understood.
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