Characterization of remote N2 plasma by various techniques

Abstract

The distribution of electron temperature (Te), electron density (Ne) in a remote N2 plasma was studied with the help of emission spectroscopy, Langmuir probe diagnostic techniques. The results show that the characteristic peaks were concentrated in the spectral range of 280–440 nm, whereas NIII spectral lines were dominant. The Te varies with RF power, gas pressure and axial distance. The electronic temperature decreases as the RF power rises from 20 to 100 W. When the pressure increases from 15 to 35 Pa, the Te increases at first and then decreases. For the given RF power and pressure, the Te in the discharge area increases and the Te in the remote area decreases with the increase of the axial distance. The Ne in the remote N2 plasma was of the order of 10E15cm−3. The Ne increases when the RF power increases and decreases with the increase of the pressure and axial distance.