Year-end Sale % OFF 
Abstract
Research of emission characteristics of a pulsed forevacuum plasma electron source with layer (mesh) stabilization of emission plasma boundary has been carried out. Generation of a pulsed wide-aperture electron beam is provided by DC accelerating voltage (1–10 kV) and pulse-periodic formation of emission plasma by a cathodic arc with current 5–80 A, pulse duration 500–600 μs. Pressure (4–30 Pa) and the type of working gas (N2, O2, Ar, He, Kr) significantly influence on the emission characteristics of the forevacuum plasma electron source. An increase in the gas pressure and the use of gas with larger ionization cross-section provide an increase in the electron emission current. At low pressure (below a certain threshold value, which determined by the type of gas) an increase in the discharge current leads to an increase in the efficiency of electron emission. But at pressures more than the threshold value the emission efficiency decreases as the discharge current increases. The influence of pressure and type of gas on the emission characteristics are caused by the ion flux from the beam plasma which is formed due to ionization of gas by accelerated beam's electrons.
Published Version
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
