Abstract
Recent advances in growth techniques have enabled the synthesis of high-quality large area films of 2D materials beyond graphene. As a result, nanofabrication methods must be developed for high-resolution and precise processing of these atomically thin materials. These developments are critical both for the integration of 2D materials in complex, integrated circuitry, as well as the creation of sub-wavelength and quantum-confined nanostructures and devices which allow the study of novel physical phenomena. In this review, we summarize recent advances in post-synthesis nanopatterning and nanofabrication techniques of 2D materials which include (1) etching techniques, (2) atomic modification, and (3) emerging nanopatterning techniques. We detail novel phenomena and devices which have been enabled by the recent advancement in nanofabrication techniques and comment on future outlook of 2D materials beyond graphene.
Highlights
Semiconductor electronics and opto-electronics is a high volume, scaled-up, and commercial technology
Precise dimensional and compositional control in silicon over nm[2] device areas combined with availability of silicon in large quantities with high crystalline quality has been the key to success and prevalence of siliconbased electronics
While silicon continues to play a dominant role in microelectronics, it is approaching its fundamental limits in terms of scaling down as well as device performance.[1,2]
Summary
Emerging nanofabrication and quantum confinement techniques for 2D materials beyond graphene. Nanofabrication methods must be developed for high-resolution and precise processing of these atomically thin materials. These developments are critical both for the integration of 2D materials in complex, integrated circuitry, as well as the creation of sub-wavelength and quantum-confined nanostructures and devices which allow the study of novel physical phenomena. We summarize recent advances in post-synthesis nanopatterning and nanofabrication techniques of 2D materials which include (1) etching techniques, (2) atomic modification, and (3) emerging nanopatterning techniques. We detail novel phenomena and devices which have been enabled by the recent advancement in nanofabrication techniques and comment on future outlook of 2D materials beyond graphene
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