Abstract
With semiconductor technology feature size scaling below 100 nm, mixed-signal design faces some important challenges, caused among others by reduced supply voltages, process variation, and declining intrinsic device gains. Addressing these challenges requires innovative solutions, at the technology, circuit, architecture, and design-methodology level. We present some of these solutions, including a structured platform-based design methodology to enable a meaningful exploration of the broad design space and to classify potential solutions in terms of the relevant metrics.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
